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Multi-arc ion coating equipment has properties of fast deposition,high ionization rate,and film with good adhesion;
Our company developed a new generation arc source with permanent magnetic and electromagnetic composite,rotating transverse magnetic field enhanced in cooperation with foreign experts to optimize the work of cathode arc spot,reduce the deposition of large particles,high utilization of the target material,and comprehensive equipment Significant increase in performance;
The equipment is suitable for sputtering Cr, Mo, Ti, Au, Al, CrAI, CrB, CrMo, CrSi, TiAl, TiB,etc.and their nitride and carbide coatings, MCrAIY High temperature protective coating.
Physical Vapour Deposition is a process during which the target material is vaporised by bombardment with laser beams, magnetically refracted ions or electrons, as well as by arc discharge.
So far , glass coating methods mainly include vacuum evaporation method , sol - gel method and sputtering coating method . Especially after the emergence of magnetron sputtering technology, magnetron sputtering coated glass is widely used in modern buildings because it can coat a large area of glass with high-quality films with strong bonding force, good uniformity and good repeatability. superior.
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